The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Feb. 01, 2013
Applicant:
Materion Advanced Materials Technologies and Services Inc., Buffalo, NY (US);
Inventors:
George Michael Wityak, Albuquerque, NM (US);
Luther Wilburn Cox, Albuquerque, NM (US);
Assignee:
Materion Corporation, Mayfield Heights, OH (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); B23K 37/04 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3407 (2013.01); B23K 37/0443 (2013.01); H01J 37/342 (2013.01); H01J 37/3435 (2013.01); Y10T 156/1062 (2015.01);
Abstract
A rotary deposition target bonded to a backing tube such that the bonding material is applied only at the ends of the rotary target to form a gap between the rotary target and the backing tube to enable a target cooling fluid used during the deposition process to contact the target directly and to provide a hermetic seal to contain the cooling fluid within the gap and prevent the fluid from being exposed to the environment within the deposition chamber.