The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Jan. 16, 2013
Applicants:

Olivier Braun, St Just St Rambert, FR;

Paul Mallo, Croissy-sur-Seine, FR;

Inventors:

Olivier Braun, St Just St Rambert, FR;

Paul Mallo, Croissy-sur-Seine, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 47/32 (2006.01); A61K 8/81 (2006.01); A61Q 1/14 (2006.01); C08F 14/18 (2006.01); A61Q 19/00 (2006.01); C08F 283/01 (2006.01);
U.S. Cl.
CPC ...
A61K 8/8158 (2013.01); A61K 47/32 (2013.01); A61Q 1/14 (2013.01); A61Q 19/00 (2013.01); C08F 14/185 (2013.01); C08F 283/01 (2013.01); A61K 2800/48 (2013.01);
Abstract

A linear, branched or cross-linked anionic polyelectrolyte, resulting from the polymerisation, for 100 molar percentage: a) 50% to 99% of monomeric units including a strong, free and partially or completely salified acid function ; b) 1% to 50% of a monomeric units of formula (I): CH═CH(R1)-C(═O)—O—(CH2)n-CF3 (I), wherein R1 represents H or CH, and n is 1, 2 or 3; c) optionally greater than 0% to 5% of monomeric units of formula (II): R2-C(═O)—O—[(CH2-CH(R4)-O]m-R3 (II), wherein m is 0 to 50, R2 represents an unsaturated aliphatic monovalent radical with 2 to 4 carbon atoms, R4 represents H, CHor CHCHand R3 represents a linear or branched, saturated or unsaturated hydrocarbon aliphatic radical with 8 to 30 carbon atoms, and d) optionally greater than 0% to 5% of at least one monomer with diethylenic or polyethylenic cross-linking. The use thereof as a thickener in topical compositions.


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