The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2016

Filed:

Jul. 11, 2013
Applicant:

Agilent Technologies, Inc., Loveland, CO (US);

Inventors:

Mark Denning, San Jose, CA (US);

Mehrnoosh Vahidpour, Santa Clara, CA (US);

Assignee:

Agilent Technologies Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 7/46 (2006.01); H01J 37/32 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32247 (2013.01); H05H 1/46 (2013.01); H05H 2001/4667 (2013.01);
Abstract

A plasma generation device, a system including a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, includes: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed over the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima.


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