The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Jun. 30, 2011
Michael R. Feldbaum, San Jose, CA (US);
Justin Jia-jen Hwu, Fremont, CA (US);
David S. Kuo, Palo Alto, CA (US);
Gennady Gauzner, San Jose, CA (US);
Li-ping Wang, Fremont, CA (US);
Michael R. Feldbaum, San Jose, CA (US);
Justin Jia-Jen Hwu, Fremont, CA (US);
David S. Kuo, Palo Alto, CA (US);
Gennady Gauzner, San Jose, CA (US);
Li-Ping Wang, Fremont, CA (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
The embodiments disclose a method of stack patterning, including loading a stack into a stationary stack stage, rotating one or more ion beam grid assemblies substantially concentrically aligned with the stationary stack stage to etch the stack and controlling the operation of the one or more ion beam grid assemblies to achieve substantial axial uniformity of the etched stack.