The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
May. 21, 2014
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventors:
Xianwang Wang, Santa Clara, CA (US);
Jing Xiao, Cupertino, CA (US);
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 15/20 (2011.01); G06T 7/40 (2006.01); G06T 7/00 (2006.01); G06T 17/00 (2006.01); H04N 13/00 (2006.01); H04N 17/02 (2006.01); G06K 9/00 (2006.01); H04N 13/02 (2006.01);
U.S. Cl.
CPC ...
G06T 15/205 (2013.01); G06T 7/0022 (2013.01); G06T 7/408 (2013.01); G06T 17/00 (2013.01); H04N 13/0011 (2013.01); G06T 2207/20228 (2013.01); H04N 13/0242 (2013.01);
Abstract
Aspects of the present invention include systems and methods for generating a novel view interpolation. In embodiments, feature correspondences and geometrical contexts are used to find additional correspondences based on the assumption of the local linear transformation. The accuracy and the number of correspondence matches may be improved by iterative refinement. Having obtained a set of correspondences, a novel view image can be generated.