The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Mar. 11, 2013
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Drazen Zaric, Belgrade, RS;
Milan Sesum, Belgrade, RS;
Milos Lazarevic, Belgrade, RS;
Milos Raskovic, Belgrade, RS;
MICROSOFT TECHNOLOGY LICENSING, LLC, Redmond, WA (US);
Abstract
Detection of East Asian layout features and reconstruction of East Asian layout features is provided. Vertically written text in the fixed format document is detected and rotated for layout analysis. After layout analysis, the rotated text is rotated back and restructured in a flow format document. When a plurality of characters is written horizontally in a vertical line of text, vertically overlapping text runs are detected, designated as horizontal-in-vertical text, and are restructured as horizontal-in-vertical text in a flow format document. Lines of text are analyzed for attributes of a ruby line and are designated as ruby text, associated with corresponding text in a ruby base line, and restructured as ruby text in a flow format document. Text in a fixed format document is analyzed for detection of a particular East Asian language so that a font for the language is designated in a flow format document.