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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9328198 B1

PDFFull Text
Date of Patent:
May. 03, 2016

Filed:

Oct. 15, 2014

Composition for forming resist underlayer

Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;

Inventors:

Shigemasa Nakasugi, Shizuoka, JP;

Masato Suzuki, Shizuoka, JP;

Jin Li, Shizuoka, JP;

Motoki Misumi, Shizuoka, JP;

Yasuaki Ide, Shizuoka, JP;

Assignee:

AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;

Attorney:

Mitchell Brustein

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 69/44 (2006.01); G03F 7/30 (2006.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01); C09D 177/10 (2006.01); C08G 69/12 (2006.01); C08G 69/48 (2006.01);
U.S. Cl.
CPC ...
C08G 69/44 (2013.01); C08G 69/12 (2013.01); C08G 69/48 (2013.01); C09D 177/10 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01); H01L 21/0274 (2013.01);
Abstract

The present invention provides a dendrimer compound capable of improving critical dimension uniformity and DOF (depth of focus) margin, and also provides a composition capable of forming an underlayer film. The dendrimer compound comprises a branched chain having a central aromatic skeleton and amide or ester bond, and is contained in the composition for forming an underlayer film.

Find Patent Forward Citations

Nakasugi, Shigemasa. (2016). Composition for forming resist underlayer (U.S. Patent No. 9328198). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9328198

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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