The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Oct. 25, 2011
Naoki Kabayashi, Itoigawa, JP;
Ryochi Suzuki, Itoigawa, JP;
Motohiro Ose, Itoigawa, JP;
Yasushi Abe, Itoigawa, JP;
Naoki Kabayashi, Itoigawa, JP;
Ryochi Suzuki, Itoigawa, JP;
Motohiro Ose, Itoigawa, JP;
Yasushi Abe, Itoigawa, JP;
DENKA COMPANY LIMITED, Tokyo, JP;
Abstract
Provided are a sulfur-modified chloroprene rubber with reduced exothermicity, a molding thereof, and a production method therefor. A sulfur-modified chloroprene rubber modified at the polymer terminals with at least one compound selected from tetramethylthiuram disulfide, tetraalkylthiuram disulfides with alkyl groups having a carbon number of 2 to 7 and dialkyldithiocarbamic acid salts with alkyl groups having a carbon number of 1 to 7, wherein there are peak tops at 3.55 to 3.61 ppm and at 3.41 to 3.47 ppm inH-NMR spectrum, as determined in deuterochloroform solvent, wherein the ratio (A/B) of the peak area (A) at 3.55 to 3.61 ppm to the peak area (B) at 4.2 to 6.5 ppm is 0.05/100 to 0.50/100, and the extract with ethanol/toluene azeotropic mixture, as specified by JIS K 6229, is 3.0 to 9.0 mass %.