The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Dec. 26, 2013
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventors:
Satoshi Nagatoya, Azumino, JP;
Nobuhiro Naito, Chino, JP;
Kosuke Wakamatsu, Chino, JP;
Michiya Nakamura, Azumino, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/14 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1433 (2013.01); B41J 2/14233 (2013.01); B41J 2/162 (2013.01); B41J 2/164 (2013.01); B41J 2/1606 (2013.01); B41J 2/1623 (2013.01); B41J 2002/14241 (2013.01); B41J 2002/14419 (2013.01);
Abstract
A silicon nozzle plate has excellent liquid resistance on an inner surface of a nozzle opening and a discharge surface. A plurality of the nozzle openings are disposed in a silicon substrate of the nozzle plate. A tantalum oxide film formed by atomic layer deposition is disposed on both surfaces of the silicon substrate and the inner surface of the nozzle opening.