The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2016

Filed:

Dec. 12, 2007
Applicants:

Naoyuki Enomoto, Kitakyushu, JP;

Yasutaka Miyoshi, Kitakyushu, JP;

Tsuneo Kawashima, Kitakyushu, JP;

Takumi Miyazaki, Kitakyushu, JP;

Inventors:

Naoyuki Enomoto, Kitakyushu, JP;

Yasutaka Miyoshi, Kitakyushu, JP;

Tsuneo Kawashima, Kitakyushu, JP;

Takumi Miyazaki, Kitakyushu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 1/00 (2006.01); B29B 9/16 (2006.01); B01J 6/00 (2006.01); A61K 8/25 (2006.01); A61Q 1/02 (2006.01); A61Q 17/04 (2006.01); A61Q 19/00 (2006.01); C01B 33/12 (2006.01); C01B 33/18 (2006.01); A61K 8/02 (2006.01);
U.S. Cl.
CPC ...
B01J 6/001 (2013.01); A61K 8/025 (2013.01); A61K 8/0279 (2013.01); A61K 8/25 (2013.01); A61Q 1/02 (2013.01); A61Q 17/04 (2013.01); A61Q 19/00 (2013.01); C01B 33/12 (2013.01); C01B 33/18 (2013.01); A61K 2800/412 (2013.01); Y10T 428/2982 (2015.01);
Abstract

Disclosed are porous silica-based particles having high surface smoothness, a method for producing the porous silica-based particles, and a cosmetic comprising the porous silica-based particles. The porous silica-based particles have an average particle diameter of 0.5 to 30 μm and have a surface smoothness of a level to such an extent that, when the entire surface of the particle is observed from a photograph thereof taken by a scanning electron microscope (SEM) with a magnifying power of 10,000, a foreign matter attached to the surface thereof can be hardly seen.


Find Patent Forward Citations

Loading…