The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Sep. 20, 2012
Applicant:
Nanyang Technological University, Singapore, SG;
Inventors:
Majid Ebrahimi Warkiani, Singapore, SG;
Haiqing Gong, Singapore, SG;
Assignee:
NANYANG TECHNOLOGICAL UNIVERSITY, Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 29/05 (2006.01); B01D 67/00 (2006.01); B01D 39/08 (2006.01); B01D 46/10 (2006.01);
U.S. Cl.
CPC ...
B01D 29/05 (2013.01); B01D 39/083 (2013.01); B01D 46/10 (2013.01); B01D 67/0034 (2013.01); B01D 67/0062 (2013.01); B01D 2239/065 (2013.01); B01D 2239/1216 (2013.01); B01D 2325/021 (2013.01); Y10T 29/49826 (2015.01);
Abstract
This invention relates to a multilayer filter. The filter comprises at least a first layer comprising a plurality of openings and at least a second permeable layer overlaying the first layer and reducing the size of the openings. The filter may further comprise one or more successive layers overlaying the second layer, wherein each layer further successively reduces the size of the openings. The filter may be used for separation of particles from fluid or gas. There is also provided a method for fabricating a multilayer filter.