The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
May. 11, 2015
Jefferson Science Associates, Llc, Newport News, VA (US);
George Neil, Williamsburg, VA (US);
Michelle D. Shinn, Newport News, VA (US);
Joseph Gubeli, Gloucester, VA (US);
JEFFERSON SCIENCE ASSOCIATES, LLC, Newport News, VA (US);
Abstract
A method for improving the output beam quality of a free electron laser (FEL) by reducing the amount of emission at wavelengths longer than the electron pulse length and reducing the amount of edge radiation. A mirror constructed of thermally conductive material and having an aperture therein is placed at an oblique angle with respect to the beam downstream of the bending magnet but before any sensitive use of the FEL beam. The aperture in the mirror is sized to deflect emission longer than the wavelength of the FEL output while having a minor impact on the FEL output beam. A properly sized aperture will enable the FEL radiation, which is coherent and generally at a much shorter wavelength than the bending radiations, to pass through the aperture mirror. The much higher divergence bending radiations will subsequently strike the aperture mirror and be reflected safely out of the way.