The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2016

Filed:

Mar. 28, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka-shi, JP;

Inventors:

Masanori Watanabe, Osaka, JP;

Satoshi Komada, Osaka, JP;

Tomoya Inoue, Osaka, JP;

Kosuke Kawabata, Osaka, JP;

Assignee:

SHARP KABUSHIKI KAISHA, Osaka-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0328 (2006.01); H01L 27/15 (2006.01); H01L 31/0336 (2006.01); H01L 21/00 (2006.01); H01L 33/06 (2010.01); H01L 33/00 (2010.01); H01L 33/32 (2010.01); H01L 33/02 (2010.01); H01L 33/20 (2010.01); H01L 33/12 (2010.01);
U.S. Cl.
CPC ...
H01L 33/06 (2013.01); H01L 33/0025 (2013.01); H01L 33/025 (2013.01); H01L 33/32 (2013.01); H01L 33/12 (2013.01); H01L 33/20 (2013.01);
Abstract

Provided is a nitride semiconductor light-emitting element including in order a first n-type nitride semiconductor layer, a second n-type nitride semiconductor layer, an n-type electron-injection layer, a light-emitting layer, and a p-type nitride semiconductor layer, wherein the average n-type dopant concentration of the second n-type nitride semiconductor layer is 0.53 times or less as high as the average n-type dopant concentration of the first n-type nitride semiconductor layer, and the average n-type dopant concentration of the n-type electron-injection layer is 1.5 times or more as high as the average n-type dopant concentration of the second n-type nitride semiconductor layer.


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