The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2016

Filed:

Jul. 27, 2015
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Shoji Shukuri, Joganei, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 27/115 (2006.01); H01L 29/423 (2006.01); H01L 29/45 (2006.01); B82Y 10/00 (2011.01); H01L 21/28 (2006.01); H01L 27/02 (2006.01); H01L 27/105 (2006.01); H01L 29/792 (2006.01); H01L 23/535 (2006.01); G11C 16/10 (2006.01); G11C 16/14 (2006.01); G11C 16/26 (2006.01); G11C 16/34 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11568 (2013.01); B82Y 10/00 (2013.01); H01L 21/28273 (2013.01); H01L 21/28282 (2013.01); H01L 23/535 (2013.01); H01L 27/0207 (2013.01); H01L 27/105 (2013.01); H01L 27/115 (2013.01); H01L 27/11521 (2013.01); H01L 27/11526 (2013.01); H01L 27/11546 (2013.01); H01L 27/11573 (2013.01); H01L 29/42328 (2013.01); H01L 29/42344 (2013.01); H01L 29/45 (2013.01); H01L 29/66833 (2013.01); H01L 29/792 (2013.01); G11C 16/10 (2013.01); G11C 16/14 (2013.01); G11C 16/26 (2013.01); G11C 16/34 (2013.01); H01L 29/66825 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device including a memory cell featuring a first gate insulating film over a semiconductor substrate, a control gate electrode over the first gate insulating film, a second gate insulating film over the substrate and a side wall of the control gate electrode, a memory gate electrode over the second gate insulating film arranged adjacent with the control gate electrode through the second gate insulating film, first and second semiconductor regions in the substrate positioned on a control gate electrode side and a memory gate side, respectively, the second gate insulating film featuring a first film over the substrate, a charge storage film over the first film and a third film over the second film, the first film having a first portion between the substrate and memory gate electrode and a thickness greater than that of a second portion between the control gate electrode and the memory gate electrode.


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