The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Dec. 22, 2014
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventor:
Yun Seung Kang, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/469 (2006.01); H01L 21/033 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); H01L 21/0337 (2013.01); H01L 21/32139 (2013.01);
Abstract
Methods of forming a pattern in a semiconductor device may be provided. The methods may include sequentially forming a first hard mask layer and a second hard mask layer on an etching target layer including first and second regions, forming a first spacer layer on the second hard mask layer, forming a second hard mask pattern layer by etching the second hard mask layer using the first spacer layer, forming a second spacer layer on a sidewall of the second hard mask pattern layer, forming a first hard mask pattern layer by etching the first hard mask layer using the second spacer layer, and etching the etching target layer using the first hard mask pattern layer.