The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2016

Filed:

Apr. 23, 2014
Applicant:

Lsi Corporation, San Jose, CA (US);

Inventors:

Steven D. Cate, Los Altos, CA (US);

John W. Osenbach, Kutztown, PA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 29/40 (2006.01); H01L 21/00 (2006.01); H01L 21/56 (2006.01); H01L 21/78 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/00 (2013.01); H01L 21/563 (2013.01); H01L 21/565 (2013.01); H01L 21/78 (2013.01); H01L 24/11 (2013.01); H01L 24/17 (2013.01); H01L 24/81 (2013.01); H01L 2224/118 (2013.01); H01L 2224/11462 (2013.01); H01L 2224/11622 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/16113 (2013.01); H01L 2224/16225 (2013.01); H01L 2924/01022 (2013.01); H01L 2924/01029 (2013.01); H01L 2924/2076 (2013.01); H01L 2924/20752 (2013.01); H01L 2924/20753 (2013.01); H01L 2924/20754 (2013.01); H01L 2924/20755 (2013.01); H01L 2924/20756 (2013.01); H01L 2924/20757 (2013.01); H01L 2924/20758 (2013.01); H01L 2924/20759 (2013.01); H01L 2924/37 (2013.01);
Abstract

A process to form metal pillars on a flip-chip device. The pillars, along with a layer of solder, will be used to bond die pads on the device to respective substrate pads on a substrate. A photoresist is deposited over the device and a first set of die pads on the device are exposed by forming openings of a first diameter in the photoresist. Pillars of the first diameter are formed by electroplating metal onto the exposed die pads. Then a second photoresist deposited over the first photoresist covers the pillars of the first diameter. Openings of a second diameter are formed in the first and second photoresists to expose a second set of die pads. Pillars of the second diameter are formed by electroplating metal onto the exposed die pads. The photoresists are then removed along with conductive layers on the device used as part of the plating process.


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