The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2016

Filed:

Jun. 13, 2003
Applicants:

Hubert Cécile François Martens, Eindhoven, NL;

Ronald Joseph Antonius Van Den Oetelaar, Eindhoven, NL;

Assignee:

Koninklijke Philips N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 7/24 (2013.01); G11B 7/0045 (2006.01); G11B 7/005 (2006.01); G11B 7/007 (2006.01);
U.S. Cl.
CPC ...
G11B 7/00455 (2013.01); G11B 7/007 (2013.01); G11B 7/0052 (2013.01); G11B 7/24 (2013.01);
Abstract

A multi-stack optical data storage medium () for recording and reading using a focused radiation beam () entering through an entrance face () of the medium () is described. It has a first substrate () with present on a side thereof a first recording stack () named L, comprising a recordable type Lrecording layer (), formed in a first Lguide groove (). A first reflective layer () is present between the first Lrecording layer () and the first substrate (). A second substrate () with present on a side thereof a second recording stack () named Lis present at a position closer to the entrance face () than the Lrecording stack () and formed in a second Lguide groove (). A transparent spacer layer () is sandwiched between the recording stacks (). The first Lguide groove () has a depth G<100 nm. In this way a relatively high reflection value of the Lstack is achieved at a radiation beam wavelength of approximately 655 nm.


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