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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9324355 B1

PDFFull Text
Expired
Date of Patent:
Apr. 26, 2016

Filed:

Mar. 12, 2014

Pattern formation method, stamper manufacturing method, and magnetic recording medium manufacturing method

Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventors:

Kazutaka Takizawa, Kawasaki, JP;

Takeshi Iwasaki, Inagi, JP;

Akihiko Takeo, Kokubunji, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Stephanie Duclair

Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); G11B 5/84 (2006.01); C25D 1/10 (2006.01); H01L 21/3065 (2006.01); H01L 21/263 (2006.01); H01L 21/311 (2006.01); G03F 1/00 (2012.01); G03F 7/00 (2006.01); G11B 5/855 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8408 (2013.01); C25D 1/10 (2013.01); G03F 1/00 (2013.01); G03F 7/00 (2013.01); G11B 5/855 (2013.01); H01L 21/263 (2013.01); H01L 21/2633 (2013.01); H01L 21/3065 (2013.01); H01L 21/311 (2013.01); H01L 21/31116 (2013.01);
Abstract

According to one embodiment, a pattern formation method includes steps of forming a layer to be processed on a substrate, forming a metal microparticle layer by coating the layer to be processed with a metal microparticle coating solution containing metal microparticles and a solvent, reducing a protective group amount around the metal microparticles by first etching, forming a protective layer by exposing the substrate to a gas containing C and F and adsorbing the gas around the metal microparticles to obtain a projection pattern, and transferring the projection pattern to the layer to be processed by second etching.

Find Patent Forward Citations

Takizawa, Kazutaka. (2016). Pattern formation method, stamper manufacturing method, and magnetic recording medium manufacturing method (U.S. Patent No. 9324355). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9324355

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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