The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Nov. 06, 2013
Industrial Technology Research Institute, Hsinchu, TW;
Hsiu-Hsiang Chen, Hsinchu County, TW;
Hsin-Hsiang Lo, Hsinchu County, TW;
Chun-Chuan Lin, Hsinchu, TW;
Kuo-Yao Weng, Hsinchu, TW;
Chi-Shen Chang, Hsinchu County, TW;
Jyh-Chern Chen, New Taipei, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A particle manipulation system and a projection device are provided. The projection device includes an image source and a projection lens. The image source provides an image beam. The projection lens is disposed on a light path of the image beam and includes a zoom lens set and a focusing lens set. The zoom lens set is disposed on the light path of the image beam from the image source and includes at least two lens groups disposed in sequence on the light path of the image beam. The focusing lens set is disposed on the light path of the image beam. The zoom lens set is disposed between the image source and the focusing lens set. A photoconductor chip is disposed on the light path of the image beam from the projection lens.