The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Sep. 19, 2013
Applicant:
Dmetrix, Inc., Tucson, AZ (US);
Inventors:
Pixuan Zhou, Tucson, AZ (US);
Chen Liang, Tucson, AZ (US);
Assignee:
DMetrix, Inc., Tucson, AZ (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/26 (2006.01); G02B 21/00 (2006.01); G02B 21/36 (2006.01);
U.S. Cl.
CPC ...
G02B 21/26 (2013.01); G02B 21/367 (2013.01);
Abstract
A method for object preparation for imaging with an array microscope system without scanning. Artifact-free image is formed based on scanning-free imaging of an object array formed from spatially-separated portions of the initially spatially-continuous object that are arranged, in the object plane of the array microscope, in a pattern associated with an array of individual objectives of the array microscope. The size of an individual portion of the object does not exceed the size of a FOV of the individual objective defined in the object plane.