The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Aug. 07, 2013
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sergey Nikolaevich Koptyaev, N.Tagil Sverdlovskoy oblasti, RU;
Maxim Vladimirovich Ryabko, Dolgoprudniy, RU;
Alexander Vyacheslavovich Shcherbakov, Moscow Oblast, RU;
Alexey Dmitrievich Lantsov, Moscow Oblast, RU;
SAMSING ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
Optical measuring systems for measuring geometrical parameters of nano-objects and methods of measuring a critical size (CS) are provided. The optical method of measuring the CS includes selecting parameters of an optic scheme and an illumination condition; recording a set of nanostructure images corresponding to various wavelengths with various defocusing levels of scattered radiation; calculating a plurality of sets of images of a nanostructure with various defocusing levels, corresponding to various wavelengths of the scattered radiation with CS values within a known range; and comparing a set of measured images of the nanostructure with the sets of the calculated images and determining a best approximate value of the CS values.