The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2016

Filed:

Oct. 21, 2013
Applicant:

Jenoptik Automatisierungstechnik Gmbh, Jena, DE;

Inventors:

Werner Wollmann, Jena, DE;

Christoph Steiner, Jena, DE;

Wilfried Kraemer, Jena, DE;

Alexander Voitsch, Jena, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/20 (2014.01); B23K 26/26 (2014.01); B29C 65/16 (2006.01); B23K 26/24 (2014.01); B23K 37/02 (2006.01); B23K 26/06 (2014.01); B23K 26/08 (2014.01); B29C 65/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0063 (2013.01); B23K 26/0604 (2013.01); B23K 26/066 (2015.10); B23K 26/0853 (2013.01); B23K 26/0869 (2013.01); B23K 26/20 (2013.01); B23K 26/24 (2013.01); B23K 26/244 (2015.10); B23K 26/26 (2013.01); B23K 37/0235 (2013.01); B29C 65/167 (2013.01); B29C 65/1635 (2013.01); B29C 65/1654 (2013.01); B29C 65/1664 (2013.01); B29C 65/1667 (2013.01); B29C 65/1687 (2013.01); B29C 65/1696 (2013.01); B29C 66/1122 (2013.01); B29C 66/1312 (2013.01); B29C 66/232 (2013.01); B29C 66/24244 (2013.01); B29C 66/41 (2013.01); B29C 66/45 (2013.01); B29C 66/545 (2013.01); B29C 66/61 (2013.01);
Abstract

An apparatus for connecting two workpiece parts to form a workpiece by through-transmission welding by means of weld seams running in a preselected weld seam pattern in regions of the workpiece parts having different characteristics is provided. The apparatus has a laser beam source with a plurality of individually controllable laser beam emitters of different power which are arranged adjacently in an X direction and a homogenizer arranged downstream. At least two reflection channels are provided in the homogenizer which run parallel to one another in a Y direction and completely penetrate the homogenizer in a Z direction by a channel depth.


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