The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Aug. 16, 2012
Won Choon Choi, Daejeon, KR;
Yong Ki Park, Daejeon, KR;
NA Young Kang, Chungcheongnam-do, KR;
Min-whee Cho, Chungcheongbuk-do, KR;
Song-jong Cho, Chungcheongbuk-do, KR;
Sung Ho Cho, Daejeon, KR;
Sung Jin Yoon, Seoul, KR;
Young-ju Son, Busan, KR;
Won Choon Choi, Daejeon, KR;
Yong Ki Park, Daejeon, KR;
Na Young Kang, Chungcheongnam-do, KR;
Min-Whee Cho, Chungcheongbuk-do, KR;
Song-Jong Cho, Chungcheongbuk-do, KR;
Sung Ho Cho, Daejeon, KR;
Sung Jin Yoon, Seoul, KR;
Young-Ju Son, Busan, KR;
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, Daejeon-si, KR;
ECOPRO CO., LTD., Chungcheongbuk-do, KR;
Abstract
The present invention provides a catalyst for the decomposition of a perfluorinated compound containing a halogen acid gas, and a preparation method thereof. According to the present invention, the Ru—P—Al tri-component catalyst for the decomposition of a perfluorinated compound shows an excellent decomposition activity and durability with respect to the decomposition and removal of a perfluorinated compound containing a halogen acid gas, and thus can be used to decompose a chamber cleaning gas, an etchant, a solvent and the like of a perfluorinated compound from the semiconductor manufacturing industry to the LCD processing field. In addition, the present invention can be useful for decomposing and removing a perfluorinated compound discharged in a process using a halogen acid gas such as F, Cl, Brand the like.