The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Aug. 29, 2013
Applicant:
Samsung Electro-mechanics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Chung Hee Lee, Suwon-si, KR;
Jae Choon Cho, Suwon-si, KR;
Jong Yoon Jang, Suwon-si, KR;
Hee Sun Chun, Suwon-si, KR;
Jong Su Park, Suwon-si, KR;
Sung Hyun Kim, Suwon-si, KR;
Assignee:
SAMSUNG ELECTRO-MECHANICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/38 (2006.01); H01B 3/00 (2006.01); H01B 3/40 (2006.01); H01B 19/04 (2006.01); H01B 17/60 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
H01B 3/002 (2013.01); H01B 3/40 (2013.01); H01B 17/60 (2013.01); H01B 19/04 (2013.01); H05K 1/0366 (2013.01); H05K 1/036 (2013.01); H05K 1/0373 (2013.01); H05K 2201/0209 (2013.01); Y10T 428/265 (2015.01); Y10T 428/31511 (2015.04);
Abstract
Disclosed herein are an insulating film and a producing method of the insulating film which can address problems caused by dents by providing a reinforcing layer having the weight ratio of the silica of 60 to 80 wt % on one surface of the insulating film.