The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Aug. 11, 2014
Applicant:
Sony Corporation, Tokyo, JP;
Inventors:
Masahiro Kaida, Kumamoto, JP;
Yuu Kawaguchi, Kumamoto, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01); G02B 5/30 (2006.01); C23F 4/00 (2006.01); H05K 3/06 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3025 (2013.01); C23F 4/00 (2013.01); G02B 5/3058 (2013.01); H05K 3/061 (2013.01); H05K 2203/058 (2013.01);
Abstract
An etching process includes: forming a metal film on a substrate having a pattern formation region; forming a mask having a predetermined pattern on the metal film in the pattern formation region, and forming a resist film in part or all of a periphery of the pattern formation region; and dry-etching the metal film in the pattern formation region.