The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2016

Filed:

Mar. 13, 2015
Applicant:

Nanoprotech Co., Ltd., Daejeon, KR;

Inventors:

Yeong Ryeol Kim, Daejeon, KR;

Cheul Ock Chae, Gunsan-si, KR;

Jin Yong Kim, Daejeon, KR;

Sang Tae Kim, Cheonan-si, KR;

Assignee:

Nanoprotech Co., Ltd., Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/94 (2006.01); G01N 21/958 (2006.01);
U.S. Cl.
CPC ...
G01N 21/94 (2013.01); G01N 21/958 (2013.01);
Abstract

Provided are an apparatus and a method of detecting a foreign material capable of detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate.


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