The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2016

Filed:

Apr. 23, 2014
Applicant:

Applejack 199 L,p., San Jose, CA (US);

Inventor:

Arun Ananth Aiyer, Fremont, CA (US);

Assignee:

APPLEJACK 199 L.P., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/24 (2006.01); G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 9/02091 (2013.01); G01B 2290/70 (2013.01);
Abstract

A system and method of measuring feature depth using a common path auto-correlation low coherence interferometer including a light source having an output directed toward a first beam splitter, the first beam splitter directing at least a portion of a light beam from the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface. The first beam splitter can also pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface. The second beam splitter directs the reference light beam to a first mirror and the measurement light beam to a second mirror and combines a reflected measurement light beam from the second mirror and a reflected reference light beam from the first mirror to form an interference pattern.


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