The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2016

Filed:

Jul. 03, 2012
Applicants:

Karl F. Leeser, West Linn, OR (US);

James S. Sims, Tigard, OR (US);

Inventors:

Karl F. Leeser, West Linn, OR (US);

James S. Sims, Tigard, OR (US);

Assignee:

Novellus Systems, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 17/00 (2006.01); C23C 16/509 (2006.01); B05B 1/14 (2006.01); B05B 12/00 (2006.01); B05B 1/00 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); G05B 19/41 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/509 (2013.01); B05B 1/00 (2013.01); B05B 1/14 (2013.01); B05B 12/00 (2013.01); C23C 16/4412 (2013.01); C23C 16/45565 (2013.01); G05B 19/41 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32091 (2013.01); H01J 37/32449 (2013.01); H01J 37/32541 (2013.01); H01J 37/32568 (2013.01); H01L 21/02274 (2013.01);
Abstract

Semiconductor processing chamber showerheads with contoured faceplates, as well as techniques for producing such faceplates, are provided. Data describing deposition rate as a function of gap distance between a reference showerhead faceplate and a reference substrate may be obtained, as well as data describing deposition rate as a function of location on the substrate when the reference showerhead and the reference substrate are in a fixed arrangement with respect to each other. The two data sets may be used to determine offsets from a reference plane associated with the faceplate that determine a contour profile to be used with the faceplate.


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