The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Sep. 09, 2013
Applicant:
Basf SE, Ludwigshafen, DE;
Inventors:
Dieter Urban, Speyer, DE;
Ulrike Licht, Mannheim, DE;
Christopher Barner-Kowollik, Stutensee-Blankenloch, DE;
Guillaume Delaittre, Mannheim, DE;
Elena Frick, Karlsruhe, DE;
Assignee:
BASF SE, Ludwigshafen, DE;
Primary Examiner:
Int. Cl.
CPC ...
C07C 69/54 (2006.01); C07C 67/14 (2006.01); C07C 67/28 (2006.01); C07C 67/29 (2006.01); C07C 45/64 (2006.01);
U.S. Cl.
CPC ...
C07C 69/54 (2013.01); C07C 45/64 (2013.01); C07C 67/14 (2013.01); C07C 67/28 (2013.01); C07C 67/29 (2013.01);
Abstract
Photoreactive monomer which has (i) at least one free-radically polymerizable C—C double bond, (ii) at least one hydrophilic group selected from an ethylene glycol group and a polyethylene glycol group having at least 2 ethylene glycol units and (iii) at least one photoreactive group, the photoreactive group being a photoenolizable carbonyl group, and also a method for preparing the photoreactive monomers.