The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Jul. 03, 2012
Jeanne Spadinger Cavuoti, Corning, NY (US);
Donald A. Clark, Corning, NY (US);
Sean Matthew Garner, Elmira, NY (US);
Gregory Scott Glaesemann, Corning, NY (US);
Jun Hou, Painted Post, NY (US);
Jum Sik Kim, Horseheads, NY (US);
Toshihiko Ono, Shizuoka, JP;
Daniel Arthur Sternquist, Horseheads, NY (US);
Jeanne Spadinger Cavuoti, Corning, NY (US);
Donald A. Clark, Corning, NY (US);
Sean Matthew Garner, Elmira, NY (US);
Gregory Scott Glaesemann, Corning, NY (US);
Jun Hou, Painted Post, NY (US);
Jum Sik Kim, Horseheads, NY (US);
Toshihiko Ono, Shizuoka, JP;
Daniel Arthur Sternquist, Horseheads, NY (US);
CORNING INCORPORATED, Corning, NY (US);
Abstract
Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as NaO, KO and LiO.