The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Aug. 12, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Takanobu Manabe, Kawasaki, JP;
Yoshinori Tagawa, Yokohama, JP;
Hiroyuki Murayama, Yokohama, JP;
Shuhei Oya, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for manufacturing a liquid discharge head. The method includes a first step of forming a telecentric measurement pattern A by exposure, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in a projection exposing device, and a second step of forming a telecentric measurement pattern B by exposure under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device. The off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement patterns A and B and an amount of defocusing.