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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9314845 B1

PDFFull Text
Date of Patent:
Apr. 19, 2016

Filed:

Jul. 10, 2014

Process for producing fept-based sputtering target

Applicant:

Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;

Inventors:

Takanobu Miyashita, Tsukuba, JP;

Yasuyuki Goto, Tsukuba, JP;

Takamichi Yamamoto, Tsukuba, JP;

Ryousuke Kushibiki, Tsukuba, JP;

Masahiro Aono, Tsukuba, JP;

Masahiro Nishiura, Tsukuba, JP;

Assignee:

TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Jessee Roe

Assistant Examiner:

Christopher Kessler

Int. Cl.
CPC ...
C23C 14/24 (2006.01); B22F 3/12 (2006.01); B22F 9/08 (2006.01); C23C 14/34 (2006.01); C22C 1/05 (2006.01); C22C 5/04 (2006.01); C22C 32/00 (2006.01); G11B 5/851 (2006.01); B22F 9/04 (2006.01); C22C 1/04 (2006.01); C22C 1/10 (2006.01); H01J 37/34 (2006.01); C23C 14/06 (2006.01); C22C 38/00 (2006.01); C22C 38/16 (2006.01);
U.S. Cl.
CPC ...
B22F 3/12 (2013.01); B22F 9/04 (2013.01); B22F 9/08 (2013.01); C22C 1/0466 (2013.01); C22C 1/05 (2013.01); C22C 1/10 (2013.01); C22C 5/04 (2013.01); C22C 32/00 (2013.01); C23C 14/0635 (2013.01); C23C 14/34 (2013.01); C23C 14/3414 (2013.01); G11B 5/851 (2013.01); H01J 37/3429 (2013.01); B22F 9/082 (2013.01); B22F 2201/03 (2013.01); B22F 2999/00 (2013.01); C22C 38/002 (2013.01); C22C 38/16 (2013.01); H01J 37/3491 (2013.01); H01J 2237/3322 (2013.01); H01J 2237/3323 (2013.01);
Abstract

A process for producing an FePt-based sputtering target includes adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities so that the C powder and the metal oxide powder are contained to satisfy:0<α≦20;10≦β<40; and20≦α+β≦40,

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