The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Aug. 28, 2013
Applicant:

Advanced Energy Industries, Inc., Fort Collins, CO (US);

Inventors:

Hendrik Walde, Fort Collins, CO (US);

Joshua Brian Pankratz, Fort Collins, CO (US);

David Christie, Fort Collins, CO (US);

Brian D. Kowal, Fort Collins, CO (US);

Assignee:

Advanced Energy Industries, Inc., Fort Collins, CO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05F 1/00 (2006.01); H05H 1/24 (2006.01); H05H 1/36 (2006.01); H05H 1/48 (2006.01); H01J 37/32 (2006.01); H05H 1/34 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01); H01J 37/32944 (2013.01); H05H 1/36 (2013.01); H05H 1/48 (2013.01); H05H 2001/3494 (2013.01);
Abstract

Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. When an arc is detected, power is applied from the energy storage device to the plasma load with a reverse polarity voltage that has a polarity that is opposite of the first voltage polarity, the application of the reverse polarity voltage to the plasma load decreases a level of the current that is provided to the plasma load.


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