The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Aug. 02, 2014
Willie Song, Penang, MY;
Wui-pin Lee, Penang, MY;
Willie Song, Penang, MY;
Wui-Pin Lee, Penang, MY;
PIXART IMAGING (PENANG) SDN. BHD., Penang, MY;
Abstract
The present invention discloses a region based shutter adaptation method for image exposure. The method includes the steps of: (a) providing an image which is non-uniformly illuminated; (b) segmenting the image into two or more non-overlapping regions; (c) identifying brightness values for each of the regions when more than one brightness value has been produced for each of the regions; (d) applying the whole image with different shutters for different regions; and (e) exposing different regions for different exposure durations according to the brightness values respectively assigned to the regions, so that the present invention is capable of enabling different regions within the whole image which is non-uniformly illuminated to have different shutter adaptions.