The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Nov. 07, 2013
Applicant:

Hgst Netherlands B.v., Amsterdam, NL;

Inventors:

Thomas William Clinton, Danville, CA (US);

Kanaiyalal Chaturdas Patel, Fremont, CA (US);

Vijay Prakash Singh Rawat, San Jose, CA (US);

Sue Siyang Zhang, Saratoga, CA (US);

Assignee:

HGST Netherlands B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/31 (2006.01); G11B 5/60 (2006.01); G11B 5/00 (2006.01);
U.S. Cl.
CPC ...
G11B 5/314 (2013.01); G11B 5/3163 (2013.01); G11B 5/6088 (2013.01); G11B 2005/0021 (2013.01);
Abstract

A method of forming a wave guide for a heat assisted magnetic recording slider of a disk drive includes depositing a layer of waveguide material onto a substrate, and depositing a layer of a hard mask material onto the waveguide material. The method then includes depositing a layer of photoresist onto the hard mask material, and exposing the photoresist to produce a hard mask pattern that includes a waveguide pattern. The method also includes stripping the photoresist material leaving the hard mask pattern having a first line edge roughness. The method also includes removing the waveguide material not covered by the hard mask, the waveguide having sidewalls which having a line edge roughness which is substantially equal to the first line edge roughness. Also disclosed is an apparatus for accomplishing the method.


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