The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Aug. 02, 2013
Applicant:

Evernote Corporation, Redwood City, CA (US);

Inventors:

Phil Libin, San Jose, CA (US);

Dmitry Stavisky, Menlo Park, CA (US);

Andrew Sinkov, San Francisco, CA (US);

Assignee:

Evernote Corporation, Redwood City, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/20 (2006.01); G06K 9/62 (2006.01); G06T 7/00 (2006.01); G06K 9/22 (2006.01); G06K 9/32 (2006.01); G06F 17/30 (2006.01); G06K 9/36 (2006.01);
U.S. Cl.
CPC ...
G06K 9/2063 (2013.01); G06K 9/00523 (2013.01); G06K 9/2054 (2013.01); G06K 9/228 (2013.01); G06K 9/3216 (2013.01); G06K 9/6202 (2013.01); G06T 7/0044 (2013.01); G06F 17/30256 (2013.01); G06K 2009/226 (2013.01); G06K 2009/363 (2013.01); G06K 2209/01 (2013.01);
Abstract

Identifying at least one object in data for photographed images includes detecting a reference pattern in the data, locating the reference pattern in a table of patterns, and identifying the at least one object according to the reference pattern. The pattern may be located on the at least one object. The at least one object may be a greeting card. The pattern may categorize the greeting card by season and/or occasion. The pattern may identify a sender of the greeting card. The pattern may be provided on an item that is separate from the at least one object. The table of patterns may include a record for at least some of the patterns and the record may include additional information associated with the pattern. The additional information may include tasks that are performed in connection with the pattern. The additional information may include geometric and color parameters of the pattern.


Find Patent Forward Citations

Loading…