The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Jun. 01, 2012
Jayesh Nath, Milpitas, CA (US);
Liang Han, Sunnyvale, CA (US);
Matthew A. Mow, Los Altos, CA (US);
Hagan O'connor, Monte Sereno, CA (US);
Joshua G. Nickel, San Jose, CA (US);
Peter Bevelacqua, San Jose, CA (US);
Mattia Pascolini, Campbell, CA (US);
Robert W. Schlub, Cupertino, CA (US);
Ruben Caballero, San Jose, CA (US);
Jayesh Nath, Milpitas, CA (US);
Liang Han, Sunnyvale, CA (US);
Matthew A. Mow, Los Altos, CA (US);
Hagan O'Connor, Monte Sereno, CA (US);
Joshua G. Nickel, San Jose, CA (US);
Peter Bevelacqua, San Jose, CA (US);
Mattia Pascolini, Campbell, CA (US);
Robert W. Schlub, Cupertino, CA (US);
Ruben Caballero, San Jose, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
A test system for testing a device under test (DUT) is provided. The test system may include a DUT receiving structure configured to receive the DUT during testing and a DUT retention structure that is configured to press the DUT against the DUT receiving structure so that DUT cannot inadvertently shift around during testing. The DUT retention structure may include a pressure sensor operable to detect an amount of pressure that is applied to the DUT. The DUT retention structure may be raised and lowered vertically using a manually-controlled or a computer-controlled positioner. The positioner may be adjusted using a coarse tuning knob and a fine tuning knob. The positioner may be calibrated such that the DUT retention structure applies a sufficient amount of pressure on the DUT during production testing.