The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Feb. 03, 2012
Applicants:

Karsten Beck, Neunkirchen A.S., DE;

Sven Albrecht, Goslar, DE;

Christoph Schnitter, Holle, DE;

Timo Langetepe, The Hague, NL;

Ralph Otterstedt, Goslar, DE;

Inventors:

Karsten Beck, Neunkirchen A.S., DE;

Sven Albrecht, Goslar, DE;

Christoph Schnitter, Holle, DE;

Timo Langetepe, The Hague, NL;

Ralph Otterstedt, Goslar, DE;

Assignee:

H.C. STARCK GMBH, Goslar, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/495 (2006.01); C04B 35/626 (2006.01); H01G 9/042 (2006.01); H01L 41/187 (2006.01); H01L 41/43 (2013.01); C01G 33/00 (2006.01); C01G 35/00 (2006.01); C01B 33/00 (2006.01); C01F 7/00 (2006.01);
U.S. Cl.
CPC ...
C04B 35/495 (2013.01); C01G 33/006 (2013.01); C01G 35/006 (2013.01); H01L 41/1873 (2013.01); H01L 41/43 (2013.01); C01B 33/00 (2013.01); C01F 7/00 (2013.01); C01P 2002/52 (2013.01); C01P 2004/10 (2013.01); C04B 2235/3201 (2013.01); C04B 2235/3203 (2013.01); C04B 2235/3255 (2013.01); C04B 2235/3281 (2013.01); C04B 2235/3284 (2013.01); C04B 2235/3294 (2013.01); C04B 2235/445 (2013.01); C04B 2235/5276 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/6025 (2013.01); C04B 2235/6027 (2013.01); C04B 2235/768 (2013.01); C04B 2235/77 (2013.01);
Abstract

A process for producing a homogenous multi compound system which is hydroxide- and/or oxide-based includes a first alternative process comprising providing a first and a second refractory metal in respective hydrofluoric solutions, and mixing the first and second hydrofluoric solutions to provide a mixed hydrofluoric solution comprising a dissolved first and second refractory metal. A second alternative process comprises dissolving the first and the second refractory metal in an alternative mixed hydrofluoric solution. The mixed hydrofluoric solution or the alternative mixed hydrofluoric solution is precipitated with a precipitant to provide a solids mixture in a suspension. The first and second refractory metal is from the group consisting of Mo, W, Nb, Re, Zr, Hf, V, Sb, Si, Al, and Ta. The first and second refractory metal are different. At least one of the first and second refractory metal is provided as a fluoro and/or as an oxyfluoro complex.


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