The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Sep. 30, 2013
Fujifilm Corporation, Minato-Ku, Tokyo, JP;
Akihiko Ohtsu, Minamiashigara, JP;
Akiko Hattori, Minamiashigara, JP;
Katsuhiro Nishimaki, Minamiashigara, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
In production of a mold having a deposited film on the surface thereof as a mold release layer, a quartz substrate plasma etched employing an etching gas that includes a sedimentary gas to form a pattern of protrusions and recesses having a desired shape in a structure constituted by the quartz substrate and a mask layer, while a deposited film constituted by sediment of the sedimentary gas is formed along the pattern of protrusions and recesses. The deposited film becomes the mold release layer. Thereby, throughput of mold production is improved in the production of molds having deposited films as mold release layers on the surfaces thereof.