The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Dec. 11, 2012
Applicant:

Tokuyama Corporation, Shunan-shi, Yamaguchi, JP;

Inventors:

Naoto Takahashi, Yamaguchi, JP;

Yasuyuki Yamamoto, Yamaguchi, JP;

Assignee:

TOKUYAMA CORPORATION, Shunan-shi, Yamaguchi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/11 (2006.01); H05K 1/03 (2006.01); H05K 3/00 (2006.01); H01L 23/498 (2006.01); H01L 23/15 (2006.01); H05K 1/09 (2006.01); H01L 33/62 (2010.01); H05K 3/24 (2006.01); H05K 3/40 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0306 (2013.01); H01L 23/15 (2013.01); H01L 23/49827 (2013.01); H05K 3/0094 (2013.01); H05K 3/246 (2013.01); H01L 33/62 (2013.01); H01L 2924/0002 (2013.01); H05K 1/092 (2013.01); H05K 1/113 (2013.01); H05K 3/245 (2013.01); H05K 3/4061 (2013.01); H05K 2203/1476 (2013.01);
Abstract

The present invention provides a metallized via-holed ceramic substrate having (1) a sintered ceramic substrate, (2) an electroconductive via formed in the sintered ceramic substrate, having an electroconductive metal closely filled in a through-hole of the sintered ceramic substrate, wherein the electroconductive metal contains a metal (A) with melting point of 600° C. to 1100° C., a metal (B) with higher melting point than the metal (A), and an active metal, (3) a wiring pattern on at least one face of the sintered ceramics substrate, having an electroconductive surface layer and a plating layer thereon, wherein the electroconductive surface layer consists of an electroconductive metal containing the metal (A), the metal (B), and an active metal, (4) an active layer formed in the interface between the electroconductive via and the sintered ceramic substrate, and (5) an active layer formed in the interface between the electroconductive surface layer and the sintered ceramic substrate.


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