The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Oct. 29, 2007
Applicants:
Chiung-chi Tsai, Tanzih Township, Taichung County, TW;
Tzong-liang Tsai, Taichung, TW;
Inventors:
Chiung-Chi Tsai, Tanzih Township, Taichung County, TW;
Tzong-Liang Tsai, Taichung, TW;
Assignee:
HUGA OPTOTECH INC., Taichung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); H01L 33/22 (2010.01); H01L 29/30 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
H01L 33/22 (2013.01); H01L 21/3043 (2013.01); H01L 29/30 (2013.01);
Abstract
A method of treating a substrate includes forming a plurality of nicks on an upper surface of the substrate by an electromagnetic wave without using a mask, wherein sidewalls of each nick have fusion formed thereon; roughening the sidewalls by removing the fusion; and forming an epitaxial multi-layer structure on the upper surface and the nicks. The roughened sidewalls of each nick comprise an average roughness equal to or larger thannm.