The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Jun. 05, 2015
Applicant:

AU Optronics Corp., Hsin-Chu, TW;

Inventors:

Wen-Fang Sung, Hsin-Chu, TW;

Wang-Shuo Kao, Hsin-Chu, TW;

Chih-Wei Chen, Hsin-Chu, TW;

Assignee:

AU OPTRONICS CORP., Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02B 5/30 (2006.01); H04N 13/04 (2006.01); G02B 27/22 (2006.01); G02B 27/26 (2006.01); B05D 3/06 (2006.01); G03F 7/20 (2006.01); B05D 5/06 (2006.01); G02F 1/13363 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3083 (2013.01); B05D 3/067 (2013.01); G02B 27/22 (2013.01); G02B 27/2228 (2013.01); G02B 27/26 (2013.01); G03F 7/20 (2013.01); H04N 13/0434 (2013.01); H04N 13/0454 (2013.01); B05D 5/06 (2013.01); G02F 2001/133631 (2013.01); G02F 2413/09 (2013.01);
Abstract

A method for manufacturing phase retarder film includes steps of providing a substrate; forming an alignment layer on the substrate, the alignment layer having at least a first phase region, at least a second phase region and at least a third phase region, the third phase region being disposed between the first phase region and the second phase region, and a phase retardation of the third phase region being different from phase retardations of the first phase region and the second phase region. The phase retardation of the first phase region is different from the phase retardation of the second phase region.


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