The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Jul. 30, 2014
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Lauri Sainiemi, Espoo, FI;

Tapani Levola, Espoo, FI;

Pasi Saarikko, Espoo, FI;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); B05C 3/02 (2006.01); B05C 13/02 (2006.01); B05D 1/18 (2006.01); B05D 5/06 (2006.01); C03C 15/00 (2006.01); C03C 17/00 (2006.01); C23F 1/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1857 (2013.01); B05C 3/02 (2013.01); B05C 13/02 (2013.01); B05D 1/18 (2013.01); B05D 5/06 (2013.01); C03C 15/00 (2013.01); C03C 17/00 (2013.01); C03C 2218/111 (2013.01); C03C 2218/33 (2013.01); C23C 16/45525 (2013.01); C23F 1/02 (2013.01);
Abstract

Microfabrication processes and apparatuses for fabricating microstructures on a substrate are disclosed. The substrate has a current diffraction grating pattern formed by current surface modulations over at least a portion of the substrate's surface that exhibit a substantially uniform grating linewidth over the surface portion. An immersion depth of the substrate in a fluid for patterning the substrate is gradually changed so that different points on the surface portion are immersed for different immersion times. The fluid changes the linewidth of the surface modulations at each immersed point on the surface portion by an amount determined by the immersion time of that point, thereby changing the current diffraction grating pattern to a new diffraction grating pattern formed by new surface modulations over the surface portion that exhibit a spatially varying grating linewidth that varies over the surface portion.


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