The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2016

Filed:

Mar. 31, 2014
Applicant:

Eastman Kodak Company, Rochester, NY (US);

Inventor:

Todd Mathew Spath, Hilton, NY (US);

Assignee:

EASTMAN KODAK COMPANY, Rochester, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/22 (2006.01); H01L 21/78 (2006.01); G01N 27/04 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 27/22 (2013.01); G01N 27/041 (2013.01); H01L 21/78 (2013.01); H01L 22/14 (2013.01);
Abstract

A method for aligning a second pattern to a first pattern based on a first alignment structure on a first substrate is disclosed. The alignment structure has a different magnitude of the electrical characteristic than the substrate. A controller controls the relative position of an electrical probe with respect to the substrate to measure the electrical characteristic corresponding at a plurality of positions proximate the substrate. The measured electrical characteristics are used to identify the location of the alignment structure by identifying a difference between the measured electrical characteristic at a pair of the plurality of positions exceeding a predetermined threshold. A second substrate having the second pattern including a second alignment structure formed thereon is aligned to the first substrate by a controller based on the identified locations of the first and second alignment structures.


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