The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Feb. 27, 2012
Michael Thiel, Karlsruhe, DE;
Holger Fischer, Karlsruhe, DE;
Michael Thiel, Karlsruhe, DE;
Holger Fischer, Karlsruhe, DE;
Nanoscribe GmbH, Eggenstein-Leopoldshafen, DE;
Abstract
A method for the spatially resolved introduction of an intensity pattern of electro-magnetic radiation by at least one optic display system into a photosensitive substance having properties which can be changed by photon exposure. These properties include a first, liquid and at least one second state, with the electro-magnetic radiation being conducted via the optic display system into the photosensitive substance and here being projected on predetermined spatial coordinates, in order to create at or in an area of these spatial coordinates a change of the properties of the substance. A surface of an objective lens of the optic display system, through which the electro-magnetic radiationis emitted, is immersed in the liquid photosensitive substance. A corresponding device is provided, and the device and method can be used for the creation of micro or nano-scaled structures.