The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Oct. 11, 2013
Applicant:

Asahi Kasei Microdevices Corporation, Tokyo, JP;

Inventor:

Jun-ichi Matsuda, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7816 (2013.01); H01L 29/063 (2013.01); H01L 29/0634 (2013.01); H01L 29/0653 (2013.01); H01L 29/0847 (2013.01); H01L 29/0878 (2013.01); H01L 29/1083 (2013.01); H01L 29/66659 (2013.01); H01L 29/7835 (2013.01); H01L 29/0692 (2013.01); H01L 29/0696 (2013.01); H01L 29/1045 (2013.01);
Abstract

A field effect transistor and a semiconductor device are provided which enable a drain breakdown voltage in an off state and a drain breakdown voltage in an on state to be improved respectively. There are provided therein a field oxide film disposed on an N-type drift region positioned between a channel region of a silicon substrate and an N-type drain, an N-type drift layer disposed beneath the drift region of the silicon substrate and the drain, and an embedded layer higher in P-type impurity concentration than the silicon substrate. The embedded layer is disposed beneath the drift layer except for below at least a portion of the drain in the silicon substrate.


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