The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Nov. 08, 2012
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Robert J. Baseman, Brewster, NY (US);

Jingrui He, Yorktown Heights, NY (US);

Emmanuel Yashchin, Yorktown Heights, NY (US);

Yada Zhu, White Plains, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); H01L 21/66 (2006.01); G05B 13/04 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); G05B 13/048 (2013.01); G05B 19/41875 (2013.01); G05B 2219/32182 (2013.01); G05B 2219/32187 (2013.01); G05B 2219/32194 (2013.01); G05B 2219/45031 (2013.01); Y02P 90/22 (2015.11);
Abstract

An apparatus for performing run-to-run control and sampling optimization in a semiconductor manufacturing process includes at least one control module. The control module is operative: to determine a process output and corresponding metrology error associated with an actual metrology for a current processing run in the semiconductor manufacturing process; to determine a predicted process output and corresponding prediction error associated with a virtual metrology for the current processing run; and to control at least one parameter corresponding to a subsequent processing run as a function of the metrology error and the prediction error.


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