The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

Dec. 22, 2011
Applicant:

Tetsuya Endo, Komae, JP;

Inventor:

Tetsuya Endo, Komae, JP;

Assignee:

CANON ANELVA CORPORATION, Kawasaki-Shi, Kanagawa-Ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3455 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); H01J 37/3405 (2013.01); H01J 37/3435 (2013.01);
Abstract

A sputtering apparatus includes a target electrode capable of mounting a target, a first support member which supports the target electrode, a magnet unit which forms a magnetic field on a surface of the target, a second support member which supports the magnet unit, and a force generation portion which is provided between the first support member and the second support member, and generates a second force in a direction opposite to a first force that acts on the second support member by an action of the magnetic field formed between the target and the magnet unit, wherein the second force has a magnitude which increases as the magnet unit comes closer to the target electrode.


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