The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Jan. 26, 2012
Applicants:
Hideo Sakai, Shinjuku-ku, JP;
Yoshihiro Tawara, Shinjuku-ku, JP;
Inventors:
Hideo Sakai, Shinjuku-ku, JP;
Yoshihiro Tawara, Shinjuku-ku, JP;
Assignee:
HOYA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/28 (2012.01); G11B 5/84 (2006.01); B24B 7/22 (2006.01);
U.S. Cl.
CPC ...
G11B 5/8404 (2013.01); B24B 7/228 (2013.01); B24B 37/28 (2013.01);
Abstract
A method of manufacturing a glass substrate for a magnetic disk includes a polishing step of polishing a main surface of a glass substrate by sandwiching the glass substrate between a pair of surface plates each having a polishing pad on its surface and by supplying a polishing liquid containing polishing abrasive particles between the glass substrate and the polishing pads. In the polishing step, the polishing liquid and each polishing pad are adjusted so that the friction coefficient falls in a range of 0.02 to 0.05.