The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2016

Filed:

May. 16, 2012
Applicants:

Joy Cheng, San Jose, CA (US);

Kafai Lai, Poughkeepsie, NY (US);

Chi-chun Liu, San Jose, CA (US);

Jed W. Pitera, Portola Valley, CA (US);

Charles T. Rettner, San Jose, CA (US);

Inventors:

Joy Cheng, San Jose, CA (US);

Kafai Lai, Poughkeepsie, NY (US);

Chi-Chun Liu, San Jose, CA (US);

Jed W. Pitera, Portola Valley, CA (US);

Charles T. Rettner, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5068 (2013.01); G06F 2217/08 (2013.01);
Abstract

Methods and computer program products for designing topographic patterns for directing the formation of self-assembled domains at specified locations on substrates. The methods include generating mathematical models that operate on mathematical descriptions of the number and locations of cylindrical self-assembled domains in a mathematical description of a guiding pattern.


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